200x300mm, or 200x250mm 10 plates per box
Designed for embossed holograms origination with CW or pulsed lasers
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PHOTO-R photoresist plates are glass plates coated with photoresist. We are not using spin coating, so those plates have uniform photoresist layer thickness over whole plate surface.
We are using this photoresist to record our deep 3d image holograms and for us it produces better results than Spipley photoresist – see examples here.
Our photoresist is a positive polymeric substance – i.e. it becomes soluble in a certain solvent after exposure to short wavelength light. The photoresist layer coating is typically 1-1.5 μm thick. Geola’s photoresists are sensitive to CW and pulsed lasers radiation. Sensitivity for CW laser radiation exposure is ~1.5 mJ/cm2 at 442nm, and ~12-15mJ/cm2 for 440nm pulsed laser radiation exposure, while processed after exposure for 30seconds in AZ303 developer diluted in deionized water at 1:9.
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