for Photomasks and Radiography

35,00€359,00€

VRP photoplates

The plates are specifically designed for the manufacturing of high-precision photographic masks for microelectronics. The material is also used for Bragg diffraction X-ray tomography and radiography in many European Synchrotron facilities.

Guaranteed lifetime : 12 months
Observed lifetime : 18 months.

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VRP – Silver-Halide photoplates

VRP photographic plates are a practical replacement for Agfa (Millimask) and Kodak (HR-P, TE) plates.

The plates are specifically designed for the manufacturing of high-precision photographic masks for microelectronics. The material is also used for Bragg diffraction X-ray tomography and radiography in many European Synchrotron facilities. High resolution, high durability and excellent adhesion of the emulsion layer to the glass substrate enable photographic features of less than 2.5 micrometers to be recorded.
All photo-plates are usually supplied in a cardboard package containing 6 units each. The largest plate size available as a standard size is 406×300 mm. The standard glass thickness is 2.5 mm. All plates come with an anti-halation coating. Custom glass sizes and film substrates are available for any emulsion on request. Guaranteed lifetime – 12 months.

Figure 1 Characteristic Curve For VRP Material
Figure 1 Characteristic curve for VRP material
Figure 2 Grain Size Distribution Curve For VRP Material
Figure 2 Grain Size Distribution Curve for VRP material
VRP characteristics
Average sensitivity, ISO
Negative process:
Reversal Process:
0.02
0.04
Contrast, not less than: 5
Max. Density, not less than: 3
Spectral sensitization maximum, nm: 525
Spectral sensitization region, nm: 400-565
Fog Density, not more than: 0.02
Resolving Power, mm-1, not less than: 3,000
Strength of emulsion layer after processing, kg force, not less than: 0.9
Temperature of emulsion layer deformation, oC, not less than: 55

Processing and Handling Recommendations

Unseal and process in indirect non-actinic light with use of a dark-green light filter (transmission zone – 530 nm and less). Temperature of processing solutions – 20±2°C. Storage condition: Humidity 65% and 12-15deg. Celsius.

Recommended processing for VRP materials for the masks production
Negative process Temperature of solutions
Exposure
Developing Concentrated VRP developer diluted in distilled water 1:5,4-5min
20
Wash Rinsing water 3 min
17±2
Fixing Fixer , 5-10 min
20
Wash Water 3 min
17±2
Final Wash Water with wetting agent (Agepon) 1min
17±2
Drying Slow Air
20±4
Reversal process
Exposure
Developing Concentrated VRP developer diluted in distilled water 1:1.7, 4-5min
20
Wash Rinsing water, 3 min
17±2
Bleaching Bleach , 1.5 min
20
Wash Rinsing water, 3 min
17±2
Brightening Brightener , 3 min
20
Wash Rinsing water, 5 min
17±2
Lighting 500 W lamp, 70cm distance from the emulsion, 1 min
Second Developing Concentrated VRP developer diluted in distilled water 1:5 – 3 minutes
20
Wash Rinsing water, 1 min
17±2
Fixing Fixer , 2 min
20±4
Wash Rinsing water, 3 min
17±2
Final wash Water with wetting agent (Agepon) 1min
17±2
Drying Slow Air
20±4

 

VRP Material Processing Scheme used in X-ray Tomography and Radiography
 Procedure
Chemicals
Temperature
Exposure
Developing Kodak RP X-OMAT Developer , 5min
20
Wash 2min
17±2
Fixing Kodak RP X-OMAT LO Fixer , 5min
20
Wash Water, 10 min
17±2
Drying Slow Air
20±4

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Additional Information

Weight 2.00 kg